GAS-BARRIER FILM AND PRODUCTION METHOD OF THE SAME

PROBLEM TO BE SOLVED: To provide a gas-barrier film that has flexibility, mechanical strength and barrier performance, and is excellent in durability in a case in which temperature change generates like a solar battery and an electronic component.SOLUTION: There is provided a gas-barrier film 1 that...

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1. Verfasser: ITO HIROHIDE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a gas-barrier film that has flexibility, mechanical strength and barrier performance, and is excellent in durability in a case in which temperature change generates like a solar battery and an electronic component.SOLUTION: There is provided a gas-barrier film 1 that includes: a substrate 2; and a barrier layer 3 that is formed on one side or both sides of the substrate. The barrier layer 3 contains silicon, oxygen and carbon, and a carbon distribution curve that shows a relationship between a distance from a surface of the barrier layer 3 in a film thickness direction of the barrier layer 3, and a ratio of a carbon atom (atomic ratio of carbon) to the total amount of a silicon atom, an oxygen atom and a carbon atom has at least three extremal values, a value of variation in a distance between neighboring extremal values is 0.35 or more and 1.0 or less.