PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of selectively removing a coating covering over an object to be processed at a high speed while controlling oxidation of the surface of the object to be processed.SOLUTION: A coating removal apparatus 1 comprises: atmospheric pre...

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Bibliographische Detailangaben
Hauptverfasser:	NAKATSUKA SHIGEKI, MATSUMORI MASASHI
Format:	Patent
Sprache:	eng
Schlagworte:	CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION INSTALLATION OF ELECTRIC CABLES OR LINES, OR OF COMBINEDOPTICAL AND ELECTRIC CABLES OR LINES PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of selectively removing a coating covering over an object to be processed at a high speed while controlling oxidation of the surface of the object to be processed.SOLUTION: A coating removal apparatus 1 comprises: atmospheric pressure plasma processing units 15A and 15B that apply a plasma of a mixed gas (Ar/O) containing Oas a reactive gas to a wire 2; and atmospheric pressure plasma processing units 16A and 16B that apply a plasma of a mixed gas (Ar/H) containing Has a reactive gas to the wire 2. The plasma of the mixed gas (Ar/O) containing Oas the reactive gas dissolves the coating 4. The plasma of the mixed gas (Ar/H) containing Has the reactive gas reduces the surface of the core material 3, 3 and oxide film is removed.