ANODE OXIDATION DEVICE, ANODE OXIDATION SYSTEM, AND ANODE OXIDATION METHOD

PROBLEM TO BE SOLVED: To provide an anode oxidation device in which silicon substrates of P-type and N-type can be subjected to anode oxidation treatment, the silicon substrates can be easily attached and detached, and a large amount of the silicon substrate can be subjected to anode oxidation treat...

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Bibliographische Detailangaben
Hauptverfasser: NAKAZAWA KENICHI, HOSHIKO TAKAHIRO, MUKAI YOSHIO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an anode oxidation device in which silicon substrates of P-type and N-type can be subjected to anode oxidation treatment, the silicon substrates can be easily attached and detached, and a large amount of the silicon substrate can be subjected to anode oxidation treatment.SOLUTION: A cathode 40 is disposed in an inside of a solution tank 10 that reserves an electrolyte solution 5 and a passage 12 that performs injection and discharge to an electrolyte solution 5 is opened at a basilar part 11 of the solution tank 10, one flank 13A of the solution tank 10 is blocked by a silicon substrate 50, and the silicon substrate 50 is pressing-forced by a positive electrode 30 from an outside, the other flank 13B that counters the one flank 13A is tightly contacted by a filter 20, and a light source 21 is disposed at an outside or blocking is performed by the silicon substrate 50 as an alternate of the filter 20 and the silicon substrate 50 is pressing- forces by the positive electrode 30 from the outside.