PROCESS LIQUID SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

PROBLEM TO BE SOLVED: To provide a process liquid supply device which can supply a process liquid to a plurality of processing sections while minimizing significant decrease in substrate processing capacity of the processing section, and to provide a substrate processing apparatus including the same...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMOTO MASAYUKI, FUKUI MOTONORI, ONO KAZUYA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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