PROCESS LIQUID SUPPLY DEVICE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME

PROBLEM TO BE SOLVED: To provide a process liquid supply device which can supply a process liquid to a plurality of processing sections while minimizing significant decrease in substrate processing capacity of the processing section, and to provide a substrate processing apparatus including the same.SOLUTION: A process liquid supply device 11 for supplying a process liquid to a plurality of processing sections 5, 6 having processing units 8, 9 includes a plurality of process liquid supply systems 15a, 15b, 16a, 16b for supplying the process liquid to each processing unit 8, 9, individually. Each process liquid supply system 15a, 15b, 16a, 16b includes a tank 21 for storing the process liquid, piping 22 interconnected with the tank 21 and feeding the process liquid toward a corresponding processing section 5, 6, a pressure feed section 23 for pressure feeding the process liquid to the processing sections 5, 6 through the piping 22, and a filter 24, a flowmeter 25 and a valve member 26 provided in the way of the piping 22.