IMAGING OPTICAL SYSTEM, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY HAVING SUCH IMAGING OPTICAL SYSTEM

PROBLEM TO BE SOLVED: To reduce a diameter of the last mirror.SOLUTION: An imaging optical system (1) comprises: a plurality of mirrors (M1 to M6) for imaging an object field (3) in an object plane (5) into an image field (7) in an image plane (9); a first partial objective (11) for imaging the obje...

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Hauptverfasser:	HANS-JUERGEN MANN, DAVID SHAFER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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