IMAGING OPTICAL SYSTEM, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY HAVING SUCH IMAGING OPTICAL SYSTEM

PROBLEM TO BE SOLVED: To reduce a diameter of the last mirror.SOLUTION: An imaging optical system (1) comprises: a plurality of mirrors (M1 to M6) for imaging an object field (3) in an object plane (5) into an image field (7) in an image plane (9); a first partial objective (11) for imaging the obje...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	HANS-JUERGEN MANN, DAVID SHAFER
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To reduce a diameter of the last mirror.SOLUTION: An imaging optical system (1) comprises: a plurality of mirrors (M1 to M6) for imaging an object field (3) in an object plane (5) into an image field (7) in an image plane (9); a first partial objective (11) for imaging the object field onto an intermediate image (15); and a second partial objective (13) for imaging the intermediate image onto the image field, and comprising a penultimate mirror (M5) in a beam path of imaging light (17) between the object field and the image field, and the last mirror (M6) in the beam path. The penultimate mirror (M5) further images the intermediate image onto other intermediate image (19), and the last mirror further images the other intermediate image onto the image field.