IMPRINT APPARATUS AND IMPRINT METHOD

PROBLEM TO BE SOLVED: To suppress the crawling up of a resin against the wall face of a mold, and further, to remove the swelling up of the resin.SOLUTION: The imprint apparatus comprises: a mold of forming a pattern at a resin on a substrate; a pressing device of pressing the mold against the resin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	NISHIO CHIKARA, SHIRAI KATSUKI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To suppress the crawling up of a resin against the wall face of a mold, and further, to remove the swelling up of the resin.SOLUTION: The imprint apparatus comprises: a mold of forming a pattern at a resin on a substrate; a pressing device of pressing the mold against the resin; a flow passage in which air flows along the wall face of the mold and the surface of the resin; and a feeder of feeding the air into the flow passage. In the case the mold is contacted with the resin, the feeder feeds the air of the first pressure into the flow passage.