DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide a deposition apparatus which can achieve space saving as a whole device.SOLUTION: A deposition apparatus comprises: vacuum vessels 121-125 capable of housing substrates; a deposition mechanism 140 for forming a film on a substrate in the vacuum vessel; a tray transfe...

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1. Verfasser: IIO ITSUSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a deposition apparatus which can achieve space saving as a whole device.SOLUTION: A deposition apparatus comprises: vacuum vessels 121-125 capable of housing substrates; a deposition mechanism 140 for forming a film on a substrate in the vacuum vessel; a tray transfer mechanism 10 for transferring a substrate transfer tray 20 capable of holding a substrate in an erect state so as to adjust a plate thickness direction of the substrate to a horizontal direction, along an annular orbit in a planar view; a substrate transfer mechanism 195 for transferring a substrate in a horizontal state to allow passage of the substrate from the outside to the inside of the orbit; a substrate reception part 160A for loading the substrate on the substrate transfer tray in a horizontal state to cause the substrate transfer tray to hold the substrate, and transferring the substrate transfer tray and the substrate in a rotating manner to hold the substrate in the erect state inside the orbit.