REFLECTOR FORMING RESIN COMPOSITION, REFLECTOR, AND METHOD OF FORMING PATTERNED REFLECTIVE FILM

PROBLEM TO BE SOLVED: To provide means for forming a reflector without going through a heat processing step using a composition containing an ultraviolet-curable-silicon-resin forming component.SOLUTION: A reflector forming resin composition is used containing 5-92 mass% of a silicon resin forming c...

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Bibliographische Detailangaben
Hauptverfasser: TAZAKI MASUJI, IGARASHI NAOTO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide means for forming a reflector without going through a heat processing step using a composition containing an ultraviolet-curable-silicon-resin forming component.SOLUTION: A reflector forming resin composition is used containing 5-92 mass% of a silicon resin forming component, which is cured by ultraviolet irradiation from an ultraviolet irradiation device preferably having a spectrum both in 330-450 nm and a 500-600 nm ranges, and 8-95 mass% of titanium oxide particles.