EFFLUENT TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To improve, by targeting an effluent treatment apparatus for inducing the evaporation of an effluent, the evaporation rate of the effluent.SOLUTION: The provided effluent treatment apparatus includes an evaporation tank 4 for inducing the evaporation of a fed effluent, a heatin...

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Bibliographische Detailangaben
Hauptverfasser:	YAMAMOTO AKIHIRO, KAMADA HIROMITSU, MASUNARI SEIJI, NAKANO TERUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR CHEMISTRY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve, by targeting an effluent treatment apparatus for inducing the evaporation of an effluent, the evaporation rate of the effluent.SOLUTION: The provided effluent treatment apparatus includes an evaporation tank 4 for inducing the evaporation of a fed effluent, a heating chamber 9 for heating the evaporation tank 4 with the heat of a burner 6, an exhaust gas circulation tube 7, and a gas supply tube 8. An exhaust gas emitted from the heating chamber 9 past the effluent interior within the evaporation tank 4 is circulated through the exhaust gas circulation tube 7. The gas supply tube 8 possesses, on the side of one terminal thereof, a gas eruption unit 8a from which a heated gas is scheduled to erupt. Within the effluent of the evaporation tank 4, the gas eruption unit 8a is configured closer to the effluent liquid surface than to the exhaust gas circulation tube 7.