METHOD OF MANUFACTURING LASER REFLECTIVE MASK

PROBLEM TO BE SOLVED: To provide a laser reflective mask capable of enhancing accuracy by patterning a large number of reflective films having different etching rates effectively, and to provide a manufacturing method therefor.SOLUTION: Manufacturing process of a mask is facilitated and an exact pat...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIM SU CHAN, LEE CHAN KOO, KIM YONG MUN, YOON HYEONG RYEOL, PARK NAE HWANG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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