METHOD OF MANUFACTURING LASER REFLECTIVE MASK

PROBLEM TO BE SOLVED: To provide a laser reflective mask capable of enhancing accuracy by patterning a large number of reflective films having different etching rates effectively, and to provide a manufacturing method therefor.SOLUTION: Manufacturing process of a mask is facilitated and an exact pat...

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Bibliographische Detailangaben
Hauptverfasser:	KIM SU CHAN, LEE CHAN KOO, KIM YONG MUN, YOON HYEONG RYEOL, PARK NAE HWANG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a laser reflective mask capable of enhancing accuracy by patterning a large number of reflective films having different etching rates effectively, and to provide a manufacturing method therefor.SOLUTION: Manufacturing process of a mask is facilitated and an exact pattern is formed by laminating reflective films 220a having a reflectance difference sequentially and repeatedly above a base substrate 200 where reflective film embedding grooves of a predetermined depth are formed in the reflection region of laser beam, removing the reflective film laminated in the region excepting that embedded in the reflective film embedding grooves 202 through chemical mechanical polishing process or lift-off process by laser beam irradiation or etching liquid, and forming a reflective film pattern in the form of embedded in the groove.