VAPOR DEPOSITION MASK MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask that can be made light even when it is made large, and by which an opening of a resin mask and a slit of a metal mask can be precisely formed.SOLUTION: A method for manufacturing a vapor deposition mask 100 formed by...

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Bibliographische Detailangaben
Hauptverfasser: OBATA KATSUYA, TAKEDA TOSHIHIKO, KENMORI HIDESUKE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask that can be made light even when it is made large, and by which an opening of a resin mask and a slit of a metal mask can be precisely formed.SOLUTION: A method for manufacturing a vapor deposition mask 100 formed by laminating a metal mask 15 with a slit 16, and a resin mask 25 provided with an opening 50 corresponding to a vapor deposition manufactured pattern comprises the steps of: preparing a metallic plate 10 with a resin layer on one surface of which a resin layer 20 is provided; forming a resin mask 25 on the resin layer by forming an opening corresponding to the vapor deposition manufactured pattern; and forming the metal mask by applying etching from a face side not contacting the resin mask of the metallic plate and forming a slit penetrating through the metallic plate and overlaid on an opening of the resin mask.