POLYCRYSTALLINE SILICON FILM INSPECTION METHOD AND DEVICE THEREFOR

PROBLEM TO BE SOLVED: To enable determination of excess and deficiency of excimer laser energy in annealing from an image acquired by imaging a polycrystalline silicon film annealed by a line-shaped excimer laser beam.SOLUTION: A polycrystalline silicon film inspection method comprises: irradiating with light a substrate on which a polycrystalline silicon film is formed on a surface by laser annealing using an excimer laser beam formed in a line shape; imaging an image of primary diffracted light generated from a surface of the polycrystalline silicon film irradiated with light; forming an image of the polycrystalline silicon film by processing the image of the primary diffracted light obtained by the imaging; creating a reference image to be obtained by imaging a primary diffracted image of the annealed polycrystalline silicon film when the polycrystalline silicon film is annealed with proper laser energy and without fluctuation in the energy by using the excimer laser beam formed in the line shape; and creating a difference image between the image of the formed polycrystalline silicon film and the created reference image and displaying the created difference image on a screen.