APPARATUS INCLUDING ELECTROMAGNETIC WAVEGUIDE AND PLASMA SOURCE

PROBLEM TO BE SOLVED: To provide a plasma source having the structure that generates symmetric plasma.SOLUTION: The apparatus comprises: an electromagnetic waveguide 101; a first iris slot 110 crossing the waveguide 101 at a first position along a length of the waveguide 101 and having a height less...

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Bibliographische Detailangaben
Hauptverfasser:	THOMAS ERWIN PREUSS, MICHAEL RON HAMMER, JOHN PILLANS
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma source having the structure that generates symmetric plasma.SOLUTION: The apparatus comprises: an electromagnetic waveguide 101; a first iris slot 110 crossing the waveguide 101 at a first position along a length of the waveguide 101 and having a height less than that of the waveguide 101; a second iris slot 112 crossing the waveguide 101 at a second position along the length of the waveguide 101 and having a height less than that of the waveguide 101; and a plasma torch having a longitudinal axis crossing the waveguide 101 at a position between the first and second iris slots 110, 112. The first iris slot 110 and the second iris slot 112 are configured to transmit electromagnetic fields that are substantially transverse to the longitudinal axis of the plasma torch to excite plasma in the plasma torch, and the heights of the first iris slot 110 and the second iris slot 112 are less than 70% of the diameter of the torch.