ULTRAVIOLET IRRADIATION APPARATUS

PROBLEM TO BE SOLVED: To enable, within a to-be-processed liquid, the extermination of microbes, oxidative degradations of organic matters, decompositions of other toxic substances, etc. while inhibiting the attenuation of ultraviolet irradiation dosage.SOLUTION: The provided ultraviolet irradiation...

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Bibliographische Detailangaben
Hauptverfasser:	DEGUCHI KENICHIRO, KOFUJITA TAKESHI, KAGARA TOSHIYUKI, FUJII TAKASHI, YAMAGUCHI SATOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS THEIR RELEVANT APPARATUS TRANSPORTING TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To enable, within a to-be-processed liquid, the extermination of microbes, oxidative degradations of organic matters, decompositions of other toxic substances, etc. while inhibiting the attenuation of ultraviolet irradiation dosage.SOLUTION: The provided ultraviolet irradiation apparatus comprises a container 14 on which an inflow port 15 and an outflow port 16 for a to-be-processed liquid are configured, an ultraviolet-permeable protective tube 17 configured within the container 14, an ultraviolet lamp 20 inserted within this protective tube 17, and a FEP film 19 coated on at least either of inner and outer surfaces of the protective tube 17. The surface of the protective tube 17 contacted with the FEP film 19 is an uneven surface formed by any of a sandblast treatment, chemical etching treatment, a plasma treatment, and a lathe cutting work.