OPTICAL CHARACTERISTIC MEASURING OPTICAL SYSTEM, OPTICAL CHARACTERISTIC MEASURING METHOD AND APPARATUS, AND EXPOSURE METHOD AND APPARATUS

PROBLEM TO BE SOLVED: To easily and highly accurately measuring optical characteristics of at least one of two optical systems by detecting illumination light that passes the two optical systems.SOLUTION: In a measurement method of polarization properties of an illumination system ILS that illuminates a pattern of a reticle surface RP and a projection optical system PO that forms an image of the pattern of the reticle surface RP on an image surface IP, a polarization state is measured by disposing a property measuring optical system 24A between the illumination system ILS and the projection optical system PO that reflects light from the illumination system ILS a plurality of times, transfers the state and introduces the light to the projection optical system PO, and receiving the light from the illumination system ILS through the property measuring optical system 24A and the projection optical system PO.