PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus having a high-frequency power supply supplying a time-modulated high-frequency power that can be controlled in a wide range and with high accuracy, and to provide a plasma processing method using the plasma processing apparatus.SOLUTION:...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	OGOSHI YASUO, OHIRAHARA YUZO, ONO TETSUO, MORIMOTO MICHIKAZU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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