MATERIAL FOR HOLDING ARTICLE TO BE POLISHED

PROBLEM TO BE SOLVED: To provide a material for holding an article to be polished, which has no buff streak on a surface and which improves surface waviness.SOLUTION: A material 1 for holding an article to be polished includes a foam layer 3 having tear-drop type air bubbles 2. While a surface close...

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Bibliographische Detailangaben
Hauptverfasser:	OTO TAKESHI, YAMAMOTO KEIJI, KAWABATA KATSUMASA, TAMAGAWA TOMOHITO, HABA SHINICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a material for holding an article to be polished, which has no buff streak on a surface and which improves surface waviness.SOLUTION: A material 1 for holding an article to be polished includes a foam layer 3 having tear-drop type air bubbles 2. While a surface close to an overgrown part of the tear-drop type air bubbles 2 serves as a holding surface for holding the article to be polished, an adhesive member 6 for being fixed to a surface plate is stuck on a surface close to a taper-shaped part of the tear-drop type air bubbles 2. The holding surface is formed by being separated from a smooth base material.