PLASMA PROCESSING APPARATUS, AND HIGH-FREQUENCY WAVE GENERATOR

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of more stably generating a plasma in a wide region ranging from a low power to a high power, and that enables construction of wide process conditions.SOLUTION: A plasma processing apparatus comprises: a processing container in w...

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Bibliographische Detailangaben
Hauptverfasser:	FUNASAKI KAZUNORI, KANEKO KAZUFUMI, KATO HIDEO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BASIC ELECTRONIC CIRCUITRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION OF NOISE BY SUCH CIRCUITS GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING,BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN ANON-SWITCHING MANNER PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a plasma processing apparatus capable of more stably generating a plasma in a wide region ranging from a low power to a high power, and that enables construction of wide process conditions.SOLUTION: A plasma processing apparatus comprises: a processing container in which a process by a plasma is performed; and a plasma generation mechanism including a high-frequency wave generator arranged outside the processing container and generating a high-frequency wave, and generating a plasma in the processing container by using the high-frequency wave generated by the high-frequency generator. The high-frequency generator comprises: a high-frequency wave oscillator oscillating the high-frequency wave; a power supply part supplying a power to the high-frequency wave oscillator; a waveguide propagating the high-frequency wave oscillated by the high-frequency wave oscillator to the processing container side that is a load side; and a voltage standing wave ratio variable mechanism (61) changing a voltage standing wave ratio of a voltage standing wave formed in the waveguide by the high-frequency wave, depending on the power supplied from the power supply part.