VAPOR DEPOSITION DEVICE

PROBLEM TO BE SOLVED: To provide a vapor deposition device capable of improving use efficiency of a material to an upper limit.SOLUTION: A vapor deposition device has: a vapor deposition chamber 2; and a substrate carrying chamber 3 having a substrate carrying mechanism for carrying a substrate 1 into and from the vapor deposition chamber 2. The vapor deposition chamber 2 is provided with: a substrate carrying-in region 6 having a first substrate moving mechanism 5 for moving up and down the carried-in substrate 1 from the substrate carrying chamber 3 via a substrate carrying inlet 4; a substrate carrying-out region 9 having a second substrate moving mechanism 7 for moving up and down the vapor-deposited substrate 1 and carrying the substrate 1 to the substrate carrying chamber 3 via a substrate carrying outlet 8; a third substrate moving mechanism 10 for horizontally moving the substrate 1 to the substrate carrying-out region 9 from the substrate carrying-in region 6; and an evaporation source 11 for vapor-depositing the substrate 1 while the substrate 1 is moved from the substrate carrying-in region 6 to the substrate carrying-out region 9 by the third substrate moving mechanism 10.