MASK HOLDING MECHANISM OF CONTACT EXPOSURE

PROBLEM TO BE SOLVED: To provide the mask holding mechanism of a contact exposure free from the breakage of a mask where the whole face of the mask is adsorbed on a mask holding frame.SOLUTION: A mask holding mechanism 4 of a contact exposure PE comprises: a workpiece stage 1 capable of holding a su...

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Bibliographische Detailangaben
1. Verfasser:	AIHARA TOSHIYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide the mask holding mechanism of a contact exposure free from the breakage of a mask where the whole face of the mask is adsorbed on a mask holding frame.SOLUTION: A mask holding mechanism 4 of a contact exposure PE comprises: a workpiece stage 1 capable of holding a substrate W as the material to be exposed; a mask holding frame 8 capable of holding a mask M arranged oppositely to the substrate W so as to be contacted therewith; and irradiation means 3 of irradiating the substrate W with light for pattern exposure via the mask M, and comprises: a plurality of vacuum suction grooves 21 provided at the inner circumferential edge of the mask holding frame 8; and a sealing member 22 provided so as to surround the vacuum suction grooves 21, and in which an elastic member 23 with an elastic coefficient different from that of the sealing member 22 is arranged adjacently to the sealing member 22, and the whole face of the mask M is adsorbed on the mask holding frame 8.