PHOTODIODE AND PHOTODIODE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a scalable large area (greater than 1 square foot) fabrication method of photodiodes on flat surfaces and curved surfaces.SOLUTION: A method includes the steps of: providing a substrate 12; solution-depositing a quantum nanomaterial layer 14 onto the substrate 12, th...

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Bibliographische Detailangaben
Hauptverfasser:	NICOLE L ABUEG, EULISS LARKEN E, DAVIS KEITH J, BREWER PETER D, BRETT NOSHO, G MICHAEL GRANGER
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a scalable large area (greater than 1 square foot) fabrication method of photodiodes on flat surfaces and curved surfaces.SOLUTION: A method includes the steps of: providing a substrate 12; solution-depositing a quantum nanomaterial layer 14 onto the substrate 12, the quantum nanomaterial layer including an arbitrary number of quantum nanomaterials 22 having a ligand coating 24; and applying a thin-film oxide layer 16 over the quantum nanomaterial layer 14.