SUBSTRATE TRANSFER APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus capable of transferring a substrate while suppressing uneven drying of a coating film on the substrate.SOLUTION: The substrate transfer apparatus transfers a substrate while floating, by traveling a substrate guide while holding the sub...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAMAKAWA KENJI, MIYAJIMA YUYA, UCHIGATA TOMOO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus capable of transferring a substrate while suppressing uneven drying of a coating film on the substrate.SOLUTION: The substrate transfer apparatus transfers a substrate while floating, by traveling a substrate guide while holding the substrate, that is floating by supersonic vibration. The substrate guide includes a substrate abutting portion abutting against the substrate, and a floating unit for floating the substrate abutting portion to a position of a predetermined height from a diaphragm. The floating unit includes an air pad having an air discharge part for discharging air toward the diaphragm, and an air vent channel for releasing the air discharged from the air discharge part. The air vent channel is provided at least between the air discharge part and the substrate abutting against the substrate abutting portion, and is formed so as to release the air in a gap formed by the air pad and the diaphragm toward a position higher than the position of the substrate.