CLEANING APPARATUS, CLEANING METHOD AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To provide a cleaning apparatus in which a cleaning solution on a holding body can be prevented from scattering from the opening of cleaning/drying means to the outside.SOLUTION: A cleaning apparatus 50 includes cleaning/drying means 60 movable for a holding body 40. The cleani...

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1. Verfasser: UMENO SHINICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a cleaning apparatus in which a cleaning solution on a holding body can be prevented from scattering from the opening of cleaning/drying means to the outside.SOLUTION: A cleaning apparatus 50 includes cleaning/drying means 60 movable for a holding body 40. The cleaning/drying means 60 includes a cleaning mechanism 63 discharging a cleaning solution to the holding body 40, a first gas jet mechanism 70 provided between the cleaning mechanism 63 and an opening 61b in a cover 62, and jetting a first gas to the holding body 40, and a second gas jet mechanism 80 provided between the first gas jet mechanism 70 and the opening 61b in the cover 62, and jetting a second gas to the holding body 40. The second gas jet mechanism 80 is provided at a position facing a holding groove 41 of the holding body 40, and has a slit 83 for jetting the second gas to the holding groove 41. The second gas is jetted from the slit 83 toward the opposite side of the opening 61b.