EXPOSURE EQUIPMENT, DEVICE MANUFACTURING METHOD AND EXPOSURE EQUIPMENT CONTROL METHOD

PROBLEM TO BE SOLVED: To provide exposure equipment which can inhibit an influence which is caused by leakage of a liquid for forming a liquid immersion region and applied to devices and components around a substrate thereby to enable good exposure processing to be performed.SOLUTION: Exposure equip...

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Bibliographische Detailangaben
Hauptverfasser:	SAKAKIBARA YASUYUKI, TAKAIWA HIROAKI, UMAGOME NOBUTAKA, KOBAYASHI NAOYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide exposure equipment which can inhibit an influence which is caused by leakage of a liquid for forming a liquid immersion region and applied to devices and components around a substrate thereby to enable good exposure processing to be performed.SOLUTION: Exposure equipment for exposing a substrate by projecting a pattern image on a substrate through a projection optical system and a liquid comprises a liquid supply mechanism for supplying a liquid between the projection optical system and the substrate. The liquid supply mechanism stops supply of the liquid when abnormality is detected.