PROCESSING METHOD FOR HALOGEN-CONTAINING POLYMETHACRYLIC ACID ESTER

PROBLEM TO BE SOLVED: To provide a processing method for improving the thermal stability of polymethacrylic acid ester having a halogen atom at its end.SOLUTION: The processing method includes: dissolving polymethacrylic acid ester having a halogen atom at its end in a polar solvent having a dipole...

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Hauptverfasser: ONUMA TAEKO, SAKASHITA KEIICHI, NODA TETSUYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a processing method for improving the thermal stability of polymethacrylic acid ester having a halogen atom at its end.SOLUTION: The processing method includes: dissolving polymethacrylic acid ester having a halogen atom at its end in a polar solvent having a dipole moment of 3 D or more; adding a weak base, such as a mercaptan potassium salt or sodium carboxylate, to the resulting mixture; and heating the mixture to convert selectively the polymer having the halogen atom at the end into a polymer having the end lactonized. This processing method improves the thermal stability of the polymethacrylic acid ester.