METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, which is capable of suppressing diffusion of Ni in a metal pattern containing Ni.SOLUTION: The present invention is the method of manufacturing a semiconductor device, which comprises the steps of: forming a metal pat...

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Bibliographische Detailangaben
1. Verfasser:	NISHIZAWA SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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