VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a method for controlling excellent transfer under a situation in which a time necessary for processing is not stable in a vacuum processing apparatus of a linear tool in which a plurality of transfer robots are arranged in a transfer mechanism part with a processing...

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Hauptverfasser: NOGI KEITA, NAKADA TERUO, INOUE TOMOMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for controlling excellent transfer under a situation in which a time necessary for processing is not stable in a vacuum processing apparatus of a linear tool in which a plurality of transfer robots are arranged in a transfer mechanism part with a processing chamber connected thereto, and an object to be processed is transferred between the plurality of robots.SOLUTION: A load lock existing on a path to the processing chamber or a wafer holding mechanism of an intermediate chamber is reserved in each next transfer predetermined wafer in each processing chamber, and in the case where load locks or holding mechanisms of the intermediate chamber are entirely reserved, a transfer destination is determined except the processing chamber when determining the transfer destination of the next wafer to be transferred.