METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE OF PERIODIC TABLE GROUP 13 METAL NITRIDE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a periodic table group 13 metal nitride semiconductor substrate capable of improving the anisotropy of warps of a crystal and suppressing the generation of pits.SOLUTION: The anisotropy of warps of a crystal can be improved and the generati...

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Hauptverfasser: MIYAKE HIDETO, NAGAO SATORU, ENATSU YUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a periodic table group 13 metal nitride semiconductor substrate capable of improving the anisotropy of warps of a crystal and suppressing the generation of pits.SOLUTION: The anisotropy of warps of a crystal can be improved and the generation of pits can be suppressed by growing the crystal on a growing starting face using a base substrate which has two or more grooves and/or groove rows extending in different directions respectively parallel to a growing starting face on the growing starting face and in which the grooves and/or the groove rows do not directly contact each other.