SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a semiconductor device capable of reducing a chip area by reducing resistance RSS(on) between source electrodes.SOLUTION: A semiconductor device 10 comprises a chip 11 divided into three regions: a first region 11a, a second region 11b, and a third region 11c, and a...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SUZUKI KAZUKI, KORENARI TAKAHIRO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a semiconductor device capable of reducing a chip area by reducing resistance RSS(on) between source electrodes.SOLUTION: A semiconductor device 10 comprises a chip 11 divided into three regions: a first region 11a, a second region 11b, and a third region 11c, and a common drain electrode provided on a rear surface of the chip 11. The second region 11b is formed between the first region 11a and the third region 11c. A first MOSFET is formed in the first region 11a and in the third region 11b. A second MOSFET is formed in the second region 11c.