METHOD AND PROGRAM FOR CONTROLLING OPC PROCESSING, AND METHOD FOR MANUFACTURING MASK

PROBLEM TO BE SOLVED: To provide a technique capable of easily executing OPC (Optical Proximity Correction) processing for a bent gate.SOLUTION: In a method for controlling a workstation executing OPC processing, the workstation determines an oblique line of a bent gate of a layer LA whose length is to be measured contained in a mask layout data, and generates a first rectangle figure data A in which the determined oblique line is regarded as a diagonal line. The workstation generates a layer LB to be corrected that is composed of rectangle figures, by performing cutout of the first rectangle figure data A from the layer LA whose length is to be measured. The workstation generates mask layout data after correction by performing synthesis processing or the cutout processing on a second rectangle figure data B for the layer LB to be corrected.