PATTERNED RETARDATION FILM, IMAGE DISPLAY DEVICE, MOLD FOR MANUFACTURING PATTERNED RETARDATION FILM, AND METHOD FOR MANUFACTURING PATTERNED RETARDATION FILM

PROBLEM TO BE SOLVED: To prevent generation of a strip region with different brightness compared to other portions in an image display device of a passive system using a patterned retardation film.SOLUTION: An alignment layer 3 and a retardation layer 4 are successively disposed on a substrate 2 com...

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Bibliographische Detailangaben
1. Verfasser:	KOSAKA YOSUKE
Format:	Patent
Sprache:	eng
Schlagworte:	DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC COMMUNICATION TECHNIQUE ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS PICTORIAL COMMUNICATION, e.g. TELEVISION TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:	PROBLEM TO BE SOLVED: To prevent generation of a strip region with different brightness compared to other portions in an image display device of a passive system using a patterned retardation film.SOLUTION: An alignment layer 3 and a retardation layer 4 are successively disposed on a substrate 2 comprising a transparent film material, in which the retardation layer 4 gives a retardation responding to exiting light from an image display panel by an alignment regulating force of the alignment layer 3. The retardation layer 4 includes: a first region (A) having a slow axis in a first direction and a second region (B) having a slow axis in a second direction different from that of the first region (A), alternately arranged; and between the first region (A) and the second region (B), a non-alignment region (C) is disposed in a width ranging from 20 μm to 150 μm, showing a gradual increase in the alignment degree of the slow axis toward the first region (A) and/or the second region (B).