METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK

PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask, which satisfies both enhancement in definition and a reduction in weight even if a size is increased.SOLUTION: A method for manufacturing a vapor deposition mask 100 that is formed by laminating a metal mask 15 form...

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Bibliographische Detailangaben
Hauptverfasser: NISHIMURA SUKEYUKI, HOTTA TAKESHI, OBATA KATSUYA, TAKEDA TOSHIHIKO, KENMORI HIDESUKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask, which satisfies both enhancement in definition and a reduction in weight even if a size is increased.SOLUTION: A method for manufacturing a vapor deposition mask 100 that is formed by laminating a metal mask 15 formed with a slit 16 and a resin mask 25 formed with an opening corresponding to a pattern to be produced in a position overlapping with the slit by means of vapor deposition, each other includes: a step of forming a recessed part having an opened shape wider than the opening 50 of the resin mask, in a metal plate 10 by etching one surface of the metal plate so as not to perforate the metal plate; a step of forming a resin layer on the one surface of the metal plate so as to cover the recessed part; a step of forming the metal mask by etching the other surface of the metal plate to form the slit that is integrated with the recessed part in the metal plate; and a step of forming the resin mask by forming the opening corresponding to the pattern to be produced in the resin layer by means of vapor deposition.