VAPOR DEPOSITION DEVICE

VAPOR DEPOSITION DEVICE

PROBLEM TO BE SOLVED: To provide a vapor deposition device in which rotation driving force is transmitted from a substrate holder rotary driver to a plurality of substrate holders each provided around a substrate holder rotary plate and having a gear in its outer periphery via the substrate holder r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAKAHASHI YUZURU, ISHIHAMA YOSHIYASU, KODAMA YOSHIFUMI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vapor deposition device in which rotation driving force is transmitted from a substrate holder rotary driver to a plurality of substrate holders each provided around a substrate holder rotary plate and having a gear in its outer periphery via the substrate holder rotary plate provided in the center of a reactor and having a gear in its outer periphery to rotate the substrate holders, the device allowing a susceptor holding the substrate holders to be easily attached to the vapor deposition device.SOLUTION: There is provided a vapor deposition device allowing a susceptor holding substrate holders to be easily attached to the vapor deposition device by rotatably holding a substrate holder rotary plate against a base in the center via bearing balls held by a bearing ball holding tool 1.