METHOD FOR TESTING PHOTOMASK ARTICLE

PROBLEM TO BE SOLVED: To provide a method for testing a photomask article to solve a problem of how to provide a defect-free photomask substrate, which is a challenge for extreme ultraviolet lithography.SOLUTION: A method for testing a photomask article 20 includes the steps of: electrically connect...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANG HSIANG-JEN, TSENG CHEN-RUI, CHEN MINGIH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!