METHOD FOR TESTING PHOTOMASK ARTICLE

PROBLEM TO BE SOLVED: To provide a method for testing a photomask article to solve a problem of how to provide a defect-free photomask substrate, which is a challenge for extreme ultraviolet lithography.SOLUTION: A method for testing a photomask article 20 includes the steps of: electrically connect...

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Hauptverfasser:	YANG HSIANG-JEN, TSENG CHEN-RUI, CHEN MINGIH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBEMICROSCOPY [SPM] CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SCANNING-PROBE TECHNIQUES OR APPARATUS TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for testing a photomask article to solve a problem of how to provide a defect-free photomask substrate, which is a challenge for extreme ultraviolet lithography.SOLUTION: A method for testing a photomask article 20 includes the steps of: electrically connecting the photomask article 20 to a sensor 31; applying a bias voltage to a plurality of testing contacts 23A of the photomask article 20 by use of a conductor 33; measuring at least one current distribution of the plurality of testing contacts 23A by use of the sensor 31; and determining quality of the photomask article 20 by taking at least the current distribution into consideration.