METHOD FOR FORMING LOW-REFLECTION FILM AND MEMBER WITH LOW-REFLECTION FILM

PROBLEM TO BE SOLVED: To provide a method for forming a porous, low-reflection film with low refraction properties on a substrate, and a member with the low-reflection film.SOLUTION: A low-reflection film-forming coating liquid containing an organotin compound and a hydrolyzate of alkoxysilane is ap...

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Hauptverfasser:	SUGIMOTO TOSHIAKI, MURAKAWA JUNJI, YAMAZAKI YUJI, TAKANOBU HISAFUMI, HARA IKUNARI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MINERAL OR SLAG WOOL MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PAINTS PHYSICS POLISHES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for forming a porous, low-reflection film with low refraction properties on a substrate, and a member with the low-reflection film.SOLUTION: A low-reflection film-forming coating liquid containing an organotin compound and a hydrolyzate of alkoxysilane is applied to a substrate surface to form a coating film. The organotin compound is contained with respect to the hydrolyzate of alkoxysilane within a range of hydrolyzate of alkoxysilane: organotin compound=99:1-50:50 expressed in terms of a molar ratio by oxide conversion. The method includes to set the coating film to a decomposition temperature or more of the organotin compound. The low-reflection film of a porous oxide film with a refractive index of 1.25 or more and 1.50 or less is formed on the substrate.