VAPOR DEPOSITION MASK MANUFACTURING METHOD AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask, wherein high fineness and light weight can be both satisfied even if the vapor deposition mask is increased in size, and to provide an organic semiconductor element manufacturing method, by which a highly fine organ...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMURA SUKEYUKI, OBATA KATSUYA, TAKEDA TOSHIHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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