VAPOR DEPOSITION MASK MANUFACTURING METHOD AND ORGANIC SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask, wherein high fineness and light weight can be both satisfied even if the vapor deposition mask is increased in size, and to provide an organic semiconductor element manufacturing method, by which a highly fine organ...

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Bibliographische Detailangaben
Hauptverfasser: NISHIMURA SUKEYUKI, OBATA KATSUYA, TAKEDA TOSHIHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for manufacturing a vapor deposition mask, wherein high fineness and light weight can be both satisfied even if the vapor deposition mask is increased in size, and to provide an organic semiconductor element manufacturing method, by which a highly fine organic semiconductor element can be manufactured.SOLUTION: A vapor deposition mask is manufactured by: a step of preparing a resin layer-attached metal plate, which has a resin layer provided on one surface of a metal plate; a step of forming a resin layer-attached metal mask by forming slits in the metal plate of the resin layer-attached metal plate, in which the slits penetrates merely the metal plate; and a step of forming a resin mask, by radiating laser from the metal mask side after the previous step and by forming, vertically and horizontally, a plurality of rows of the openings corresponding to a pattern to be manufactured on the resin layer by vapor deposition.