METHOD FOR PATTERNING NON METAL CONDUCTIVE LAYER

PROBLEM TO BE SOLVED: To provide a method for patterning a non metal conductive layer in a circuit board.SOLUTION: A non metal conductive layer 14 and a negative type photoresist layer 20 are sequentially formed on a substrate 12 of a circuit board. Subsequently, after the negative type photoresist...

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Bibliographische Detailangaben
Hauptverfasser: CHANG CHIENNG, CHIEN YUUN, LIN DA-SHAN, LIN HAN-HSIANG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for patterning a non metal conductive layer in a circuit board.SOLUTION: A non metal conductive layer 14 and a negative type photoresist layer 20 are sequentially formed on a substrate 12 of a circuit board. Subsequently, after the negative type photoresist layer is exposed through a patterned photomask 30, the negative type photoresist layer is developed using a developing solution. Next, the non metal conductive layer is etched. Lastly, the remaining photoresist layer is removed by a non-alkaline peeling solution to obtain a patterned non metal layer on the substrate.