LITHOGRAPHY DEVICE AND METHOD OF COMPENSATING FOR INTRINSIC MODE COUPLING

PROBLEM TO BE SOLVED: To provide a lithography device capable of compensating for intrinsic mode coupling along another axial direction incurred by inputting a force or a position along one axial direction, a control method, and a multi-degree-of-freedom control system.SOLUTION: A lithography device includes a component and a positioning system which is coupled to the component in an operable manner and moves the component along a first axis. The positioning system measures a position of the component along a second axis or a third axis. The positioning system controls movement of the component to compensate for influences of intrinsic mode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.