METALIZATION FILM CAPACITOR

PROBLEM TO BE SOLVED: To provide a metalization film capacitor having excellent characteristics.SOLUTION: A metalization film capacitor is constituted so that at least one metal deposition electrode 3 of a pair of first metalization film 1a and second metalization film 1b consists of: a first area 3...

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Bibliographische Detailangaben
Hauptverfasser: TAKEOKA HIROKI, KUBOTA HIROSHI, NAKATSUBO KAZUHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a metalization film capacitor having excellent characteristics.SOLUTION: A metalization film capacitor is constituted so that at least one metal deposition electrode 3 of a pair of first metalization film 1a and second metalization film 1b consists of: a first area 3a containing aluminum and magnesium; and a second area 3b provided on one end of the metallicon electrode side, containing aluminum, without containing magnesium, and having a low resistance part 5 consisting of a zinc deposition film formed thereon. As a result, diffusion of magnesium to the low resistance part 5 is suppressed, and a contact property between the metal deposition electrode 3 and a metallicon electrode 6 is maintained at a successful state.