COLUMNAR STRUCTURE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a method of inhibiting surface diffusion of an eutectic catalyst over a base substance and aggregation of catalyst grains when an intended columnar structure is obtained by using a VLS method.SOLUTION: A semiconductor manufacturing method comprises: a process of prep...

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Bibliographische Detailangaben
1. Verfasser:	KOTO MAKOTO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MICROSTRUCTURAL TECHNOLOGY NANOTECHNOLOGY PERFORMING OPERATIONS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of inhibiting surface diffusion of an eutectic catalyst over a base substance and aggregation of catalyst grains when an intended columnar structure is obtained by using a VLS method.SOLUTION: A semiconductor manufacturing method comprises: a process of preparing a base substance having a locking part; arranging a catalyst on the locking part; and a process of growing a semiconductor between the catalyst and the locking part. An eutectic temperature of the catalyst and the semiconductor is lower than an eutectic temperature of the locking part and the base substance.