SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and a substrate processing method which inhibit fume occurring during chemical treatment from flowing to the exterior.SOLUTION: This invention relates to a substrate processing apparatus 60 and the substrate processing apparatus 60 includes: a processing container 100 providing a process space where a substrate is cleaned therein; a substrate support member 200 provided in the process space and supporting the substrate; and a jetting member 300 selectively jetting multiple process liquids to the substrate placed on the substrate support member 200. The processing container 100 includes: multiple recovery cylinders 110, 121, 122, 123 where inlets allowing the process liquids to flow into the process space are stacked in a vertical direction; a first loading member 130 moving the multiple recovery cylinders 110, 121, 122, 123 in the vertical direction; and a second loading member 140 moving the one recovery cylinder 110, from among the multiple recovery cylinders, in the vertical direction relative to the other recovery cylinders 121, 122, 123.