GAS TREATMENT DEVICE

PROBLEM TO BE SOLVED: To improve a denitration effect by enhancing absorption reaction efficiency by an alkali solution of a gas to be treated without hindering a radicalization reaction caused by an electron beam when performing denitration by combinedly using electron beam radiation and wet treatm...

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Bibliographische Detailangaben
Hauptverfasser: HAYASHI KANETOSHI, YAMAGUCHI ISHO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To improve a denitration effect by enhancing absorption reaction efficiency by an alkali solution of a gas to be treated without hindering a radicalization reaction caused by an electron beam when performing denitration by combinedly using electron beam radiation and wet treatment using the alkali solution.SOLUTION: A gas treatment device having a cylindrical radiation/absorption reaction container 10 for radiating an electron beam E to a gas G to be treated containing a nitrogen oxide which is supplied therein, and denitrating the gas G to be treated by making it contact with an alkali solution L comprises: a ceiling 20 which is attached to the upper end of the reaction container 10 and in which the electron beam E passes downwardly along the axial direction of the reaction container 10; convection means (20, 24) for supplying and convecting the supplied gas G to be treated upwardly along a center axis in the reaction container 10 from a gas support port 24A in a jet flow shape; and a solution supply means (26) for causing the alkali solution L for the contact reaction with the convected and flowing gas G to be treated to flow down along the internal face of the sidewall of the reaction container 10.