METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR SUBSTRATE AND NITRIDE SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide a nitride semiconductor substrate by easily reducing organic matter and abrasive grains present in cracks and/or voids while maintaining smoothness of a polished nitride semiconductor substrate material.SOLUTION: A nitride semiconductor substrate material, which has...

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Bibliographische Detailangaben
Hauptverfasser:	TASHIRO MASAYUKI, OHATA TATSUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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