INFORMATION CALCULATION METHOD, STAGE DEVICE, EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To suppress occurrence of poor exposure.SOLUTION: An information calculation method includes calculating movement information of a substrate P so that after the speed of relative movement between the substrate P exposed via an immersion space (LS) and the immersion space (LS) b...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	NAKANO KATSUSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To suppress occurrence of poor exposure.SOLUTION: An information calculation method includes calculating movement information of a substrate P so that after the speed of relative movement between the substrate P exposed via an immersion space (LS) and the immersion space (LS) brought into contact with the substrate P is changed, the direction of the relative movement of the liquid immersion space LS is reversed on the outside of the substrate P (MV3).