SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSING METHOD

PROBLEM TO BE SOLVED: To reduce running costs required for substrate liquid processing.SOLUTION: A substrate liquid processing apparatus (1) processes a substrate (6) with a mixed liquid in which a first chemical having a predetermined concentration and a predetermined temperature is mixed at a fixe...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	AOKI MASAYA, NAKAMURA TERUHIRO, KITANO JUNICHI, UEDA KAZUNARI, SATO TAKAZO, EJIMA KAZUYOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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